LOW-POWERED 2.1-MU-S BINARY DELAY-LINE IN RADIATION-HARD SOI-BICMOS TECHNOLOGY

Authors
Citation
J. Wulleman, LOW-POWERED 2.1-MU-S BINARY DELAY-LINE IN RADIATION-HARD SOI-BICMOS TECHNOLOGY, Electronics Letters, 32(22), 1996, pp. 2071-2073
Citations number
2
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
00135194
Volume
32
Issue
22
Year of publication
1996
Pages
2071 - 2073
Database
ISI
SICI code
0013-5194(1996)32:22<2071:L2BDIR>2.0.ZU;2-O
Abstract
The requirements of the presented binary delay line are low power, sma ll area and minimum delay of 2 mu s at a clock rate of 40MHz. This bin ary delay line is implemented in 0.8 mu m radiation hard SOI-SIMOX BiC MOS-PJFET technology of DMILL and consumes <450 mu W/channel for a des ign with four channels and is part of a larger read-out chip for capac itive detectors.