OPTICAL-PROPERTIES OF EVAPORATED GE20SE80-XTLX THIN-FILMS

Citation
Mm. Abdelraheem et al., OPTICAL-PROPERTIES OF EVAPORATED GE20SE80-XTLX THIN-FILMS, Journal of Materials Science, 31(21), 1996, pp. 5759-5764
Citations number
36
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
31
Issue
21
Year of publication
1996
Pages
5759 - 5764
Database
ISI
SICI code
0022-2461(1996)31:21<5759:OOEGT>2.0.ZU;2-8
Abstract
Chalcogenide glasses with composition Ge20Se80-xTlx (x = 10, 15, 20, 2 5, 35 %) have been prepared by the usual melt-quenching technique. Thi n films of the mentioned compositions have been prepared by the electr on beam evaporation. In addition, another set taken from the compositi on of X = 30 at % with different thicknesses (d = 14.7, 30.0, 56.5, 70 .0, 101.0, 180.0 nm) have been taken into consideration. The X-ray dif fraction (XRD) analysis revealed the amorphous nature of the prepared films. It was found that, in contrast to the optical gap (E(op)), both the extent of the band tailing (B), and the band gap (E(e)) increase with increasing thallium content. In other side, E(op) showed thicknes s independency. The refractive index (n) showed obvious dependence on both composition and thickness also on the energy of the incident radi ation.