MOCVD GROWTH OF GA2SE3 ON GAAS(100) AND GAP(100) - A RAMAN-STUDY

Citation
M. Vonderemde et al., MOCVD GROWTH OF GA2SE3 ON GAAS(100) AND GAP(100) - A RAMAN-STUDY, Applied surface science, 104, 1996, pp. 575-579
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
104
Year of publication
1996
Pages
575 - 579
Database
ISI
SICI code
0169-4332(1996)104:<575:MGOGOG>2.0.ZU;2-J
Abstract
Due to its luminescence in the blue-green spectral range, Ga2Se3 has b ecome a subject of extensive research. Thin epitaxial Ga2Se3 layers we re grown on GaAs(100) and GaP(100) for the first time by metalorganic chemical vapour deposition (MOCVD). The structural and optical propert ies were investigated by transmission electron microscopy, Raman spect roscopy and photoluminescence (PL). Raman spectra were taken in a temp erature range from 100 K to 600 K using excitation energies of Ar+ and Kr+ ion lasers. Additionally the photoluminescence of the layers was measured using ultraviolet (UV) excitation. The results of this study are compared and discussed with those of other growth techniques.