DEFECT KINETICS IN SILICON DETECTOR MATERIAL

Authors
Citation
Bc. Macevoy, DEFECT KINETICS IN SILICON DETECTOR MATERIAL, Nuovo cimento della Società Italiana di Fisica. A. Nuclei, particles and fields, 109(9), 1996, pp. 1359-1370
Citations number
21
Categorie Soggetti
Physics, Particles & Fields
ISSN journal
11241861
Volume
109
Issue
9
Year of publication
1996
Pages
1359 - 1370
Database
ISI
SICI code
1124-1861(1996)109:9<1359:DKISDM>2.0.ZU;2-Z
Abstract
A numerical model based on experimental data has been used to investig ate the evolution of atomic defects in high-resistivity detector mater ial during neutron irradiation to levels expected at the CERN LHC. The complexes V2O and V3O have been identified as candidates for deep-lev el acceptor states which give rise to experimentally observed changes in the effective doping concentration. The phosphorus dopant is remove d by production of VP centres but at a rate lower than previously hypo thesised and not fully, even after heavy irradiation. The importance o f initial oxygen and carbon impurity concentrations is demonstrated in determining the radiation tolerance of the detectors. A hypothesis fo r the long-term annealing behaviour via the thermal annealing of a tri vacancy (V-3) state during heavy-particle irradiation is modelled and shown to be a possible explanation of experimental observations.