PULSED MAGNETICALLY CONFINED DISCHARGE FOR COPPER-VAPOR LASERS

Authors
LI J CHEN QM ZHANG W XIE MJ LI ZG
Citation
J. Li et al., PULSED MAGNETICALLY CONFINED DISCHARGE FOR COPPER-VAPOR LASERS, Review of scientific instruments, 67(11), 1996, pp. 4029-4030
Citations number
8
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
Journal title
Review of scientific instruments → ACNP
ISSN journal
00346748
Volume
67
Issue
11
Year of publication
1996
Pages
4029 - 4030
Database
ISI
SICI code
0034-6748(1996)67:11<4029:PMCDFC>2.0.ZU;2-W
Abstract
An extended application of the magnetron sputtering discharge is descr ibed. The discharge, called a magnetically confined discharge in the e xperiments, is pumped in a pulse mode to produce and excite copper vap or atoms for laser operation. Copper atom densities adequate for laser action (similar to 10(14) cm(-3)) are obtained in the discharge at te mperatures below 400 K. Laser operation is expected in the experimenta l apparatus with fast-rise pulse pumping. (C) 1996 American Institute of Physics.