A WATER-RESISTANT PRECURSOR IN A WET PROCESS FOR TIO2 THIN-FILM FORMATION

Citation
M. Sato et al., A WATER-RESISTANT PRECURSOR IN A WET PROCESS FOR TIO2 THIN-FILM FORMATION, Journal of materials chemistry, 6(11), 1996, pp. 1767-1770
Citations number
20
Categorie Soggetti
Chemistry Physical","Material Science
ISSN journal
09599428
Volume
6
Issue
11
Year of publication
1996
Pages
1767 - 1770
Database
ISI
SICI code
0959-9428(1996)6:11<1767:AWPIAW>2.0.ZU;2-B
Abstract
Deposition of anatase TiO2 thin films on soda-lime glass has been achi eved by firing an adhered precursor titanium(rv) complex of ethylenedi amine-N,N,N',N'-tetraacetic acid (H(4)edta) between 450 and 550 degree s C in air. The coating solution was prepared by the reaction of a neu tral [Ti(H2O)(edta)] complex, obtained from TiCl3 and H(4)edta in an a ir-oxidation process, with dipropylamine in ethanol. The crystal struc tures of the oxide films on glass substrates were examined by XRD, and some of their optical properties and electronic structure were invest igated by XPS. It was shown that TiO2 information was attainable emplo ying a water-resistant precursor derived from a stable metal complex. The thermal properties of the initial [Ti(H2O)(edta)] complex and the facile preparation of the precursor ethanol solution are also reported .