The adsorption behavior of n-pentane and cyclohexane in mica slits at
room temperature has been studied as a function of chemical potential
and gap width with multiple-beam interferometry. The measured film thi
cknesses close to saturation for large slit widths (effectively isolat
ed surfaces) range up to 7 nm with n-pentane (at a relative vapor pres
sure of 0.9996) and 3 nm with cyclohexane (at a relative vapor pressur
e of 0.995). The thickness of these adsorbed wetting films is slightly
larger than that predicted by van der Waals theory. The difference ma
y be accounted for by thermal fluctuations of the adsorbed liquid-vapo
r interface. At smaller slit widths a capillary condensation transitio
n occurs as the slit fills up with liquid. The separation at which thi
s occurs is in good agreement with a film-thickening mechanism due to
van der Waals forces across the gap only for the thickest films (t gre
ater than or equal to 6 nm). For thinner films the capillary condensat
ion transition occurs at larger than expected slit widths, and the dev
iations are large for t less than or equal to 3 nm, We speculate that
these larger than-expected condensation separations are related to a f
luctuation-enhanced film thickness in this regime. The work demonstrat
es the utility of measurements in a system consisting of a single slit
-pore, without the complications of polydispersity and connectivity of
pore networks. The results show that vapor adsorption isotherms can b
e measured with multiple-beam interferometry, i.e., in the surface for
ce apparatus.