CONDUCTING POLYMER PATTERNS VIA LASER PROCESSING

Two approaches to generate electrically conducting polymer patterns vi a laser processing are presented. The described processes are starting both from electrically insulating material. In the case of electrical insulating precursor polymers from the poly(bis-alkylthio-acetylene) type, the patterning was carried out using the 488 nm argon ion laser radiation or the 351 nm XeF excimer laser radiation, changing the cond uctivity by up to 16 orders of magnitude to about 100 S/cm in both cas es. The second system is based on a UV/laser sensitive precursor compo site consisting of a chlorine containing polymer and a polymerizable h eterocyclic monomeric compound. The two components may vary, but alway s form the polymerization-starting species by photo-induced redox proc esses. The latent images obtained by exposure through a mask can be de veloped into three-dimensional patterns by wet or dry processes, among them laser ablation techniques.