A LOW-TEMPERATURE SYSTEM WITH A PULSE UV LASER FOR SCRIBING HTSC FILMS AND SINGLE-CRYSTALS

Citation
Ap. Zhuravel et al., A LOW-TEMPERATURE SYSTEM WITH A PULSE UV LASER FOR SCRIBING HTSC FILMS AND SINGLE-CRYSTALS, Applied surface science, 106, 1996, pp. 321-325
Citations number
3
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
106
Year of publication
1996
Pages
321 - 325
Database
ISI
SICI code
0169-4332(1996)106:<321:ALSWAP>2.0.ZU;2-3
Abstract
A simple laser scribing equipment used to pattern hich-T-c films and s ingle crystals within a micron accuracy is described. A focused beam o f a UV pulsed laser serves as a cutting tool. A low temperature attach ment enables all operations to be performed at sample temperatures ran ging from 65 to 300 K. Thus it provides a means to fit the critical cu rrent of any element in a cryoelectronic circuit to a desirable value during its operational conditions.