Ap. Zhuravel et al., A LOW-TEMPERATURE SYSTEM WITH A PULSE UV LASER FOR SCRIBING HTSC FILMS AND SINGLE-CRYSTALS, Applied surface science, 106, 1996, pp. 321-325
Citations number
3
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
A simple laser scribing equipment used to pattern hich-T-c films and s
ingle crystals within a micron accuracy is described. A focused beam o
f a UV pulsed laser serves as a cutting tool. A low temperature attach
ment enables all operations to be performed at sample temperatures ran
ging from 65 to 300 K. Thus it provides a means to fit the critical cu
rrent of any element in a cryoelectronic circuit to a desirable value
during its operational conditions.