POROUS SILICON FORMATION AND OTHER PHOTOELECTROCHEMICAL EFFECTS AT SILICON ELECTRODES ANODIZED IN HYDROFLUORIC-ACID

Authors
Citation
V. Lehmann, POROUS SILICON FORMATION AND OTHER PHOTOELECTROCHEMICAL EFFECTS AT SILICON ELECTRODES ANODIZED IN HYDROFLUORIC-ACID, Applied surface science, 106, 1996, pp. 402-405
Citations number
9
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
106
Year of publication
1996
Pages
402 - 405
Database
ISI
SICI code
0169-4332(1996)106:<402:PSFAOP>2.0.ZU;2-#
Abstract
Illumination is an important parameter in the electrochemistry of sili con. A moderately doped (< 10(18) cm(-3)) n-type silicon electrode ano dized in the dark is passivated against dissolution in HF due to the a bsence of holes which promote dissolution. Under illumination a curren t proportional to the light intensity is observed. This dependence of the current on the illumination enabled us to realize relief structure s on the electrode surface without the use of standard photolithograpy . The photoassisted formation of macropores is another aspect of the p hotoelectrochemistry of silicon reported in this work. Many useful app lications such as a silicon based capacitor or photonic band gap mater ials in the infrared regime are based on photoelectrochemically etched macropores.