C. Mondello et al., GENE AMPLIFICATION IN CHINESE-HAMSTER DNA-REPAIR DEFICIENT MUTANTS, Mutation research. Mutation research letters, 346(2), 1995, pp. 61-67
In order to study the possible relationship between gene amplification
and DNA repair we analyzed the amplification of the CAD gene in four
mutants hypersensitive to UV light (CHO43RO, CHO7PV, UV5 and UV61) iso
lated in vitro from Chinese hamster cell lines (CHO-K1 and AA8). These
mutants are characterized by different defects in the nucleotide exci
sion repair mechanism and represent complementation groups 1, 9, 2, an
d 6 respectively. To evaluate the amplification ability of each cell l
ine we measured the rate of appearance of PALA resistant clones with t
he Luria and Delbruck fluctuation test. Resistance to PALA is mainly d
ue to amplification of the CAD gene. In the mutants CHO43RO, UV5 and C
HO7PV we reproducibly found an amplification rate lower than in the pa
rental cell lines (2-5 times), while in UV61 the amplification rate wa
s about 4 times higher. This result indicates that each mutant is char
acterized by a specific amplification ability and that the unefficient
removal of UV induced DNA damage can be associated with either a high
er or a lower amplification rate. However, the analysis of randomly is
olated CHO-K1 clones with normal UV sensitivity has shown variability
in their amplification ability, making it difficult to relate the spec
ific amplification ability of the mutants to the DNA repair defect and
suggesting clonal heterogeneity of the parental population.