MOLECULAR-BEAM EPITAXY OF HIGH-QUALITY ZNSE HOMO-EPITAXIAL LAYERS ON SOLID-PHASE RECRYSTALLIZED SUBSTRATES

Citation
E. Tournie et al., MOLECULAR-BEAM EPITAXY OF HIGH-QUALITY ZNSE HOMO-EPITAXIAL LAYERS ON SOLID-PHASE RECRYSTALLIZED SUBSTRATES, Applied physics letters, 69(21), 1996, pp. 3221-3223
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
21
Year of publication
1996
Pages
3221 - 3223
Database
ISI
SICI code
0003-6951(1996)69:21<3221:MEOHZH>2.0.ZU;2-E
Abstract
We study through reflection high-energy electron diffraction (RHEED) a nd low-temperature photoluminescence (PL) spectroscopy the molecular-b eam epitaxy of ZnSe homoepitaxial layers on solid-phase recrystallized substrates. We show that with a proper ex situ substrate polishing a two-dimensional (2D) RHEED pattern is readily observed when introducin g the substrate into the growth chamber at low temperature. We demonst rate that the in situ pre-growth treatment has a dramatic influence on ZnSe nucleation and that a suitable preparation leads to direct 2D gr owth of ZnSe layers which exhibit superior optical properties. The PL spectra are dominated by the near-band edge emission, with no deep-lev el and defect-related Lines. (C) 1996 American Institute of Physics.