Ea. Ashour et Bg. Ateya, ELECTROCHEMICAL-BEHAVIOR OF A COPPER-ALUMINUM ALLOY IN CONCENTRATED ALKALINE-SOLUTIONS, Electrochimica acta, 42(2), 1997, pp. 243-250
The electrochemical behaviour of a low-aluminium copper alloy (Alfa al
uminium-bronze) in concentrated (1-8 N) NaOH is characteristically pas
sive over broad potential regions, exhibiting passive currents that in
crease with alkali concentration. This passive behaviour is attributed
to a duplex film, with an inner compact part composed of Cu2O and Al2
O3 . xH(2)O and an outer porous part composed of Cu(OH)(2) and Al2O3 .
xH(2)O. The film undergoes dissolution at the film-electrolyte interf
ace while it is continuously forming at the alloy-film interface. The
film thickness is shown to increase with potential such that the poten
tial gradient in the film is constant. The alloy undergoes selective d
issolution with the de-aluminification factor depending on the potenti
al and alkali concentration. X-ray diffraction analysis of the polariz
ed alloy surface revealed the presence of Cu(OH)(2) and the selective
dissolution of the grains oriented in the 111 direction with enrichmen
t in the grains oriented in the 220 direction. Copyright (C) 1996 Else
vier Science Ltd