MAGNETIC-FIELD EFFECT ON COPPER ELECTRODEPOSITION IN THE TAFEL POTENTIAL REGION

Experimental results are reported indicating that a constant homogeneo us magnetic field of 12 kGs causes a decrease of the copper deposition overpotential (increase of copper deposition rate) in the Tafel poten tial region. The experimental results presented in this paper were ini tially submitted to this journal on 13 December, 1988 as a continuatio n of the studies in C. Noninski et al., 33rd ISE meeting, 1, 939 (1982 ) [1], V. Noninski et al., Elektronnaya obrabotka materialov, 1, 50 (1 986) [2]. Thus, the effect of magnetic field on copper electrodepositi on in the Tafel potential region has been established prior to the pap er J. P. Chopart et al., electrochim. Acta 36, 459 (1991) [3], which d oes not appear to have been recognized in the latter. Copyright (C) 19 96 Elsevier Science Ltd