INFLUENCE OF VACUUM RAPID THERMAL ANNEALING ON THE PROPERTIES OF AL AND AG FILMS ON QUARTZ

The influence of rapid thermal annealing of 700 degrees C and 800 degr ees C in 5 x 10(-5) mbar vacuum on the structure and morphology of alu minum and silver thin films, deposited on quartz substrates is investi gated. The metal films studied have thicknesses of 200 nm and 120 nm f or Al and Ag, respectively, when the annealing time ranges from 5 to 1 80 s. A recrystallization process in the Al films is observed. A corre lation between the annealing time and the equivalent parameters' chang e of the quartz resonators with silver electrodes is also found. Copyr ight (C) 1996 Elsevier Science Ltd