In this article, we study the thin films ZnO and SnO2 of 500 Angstrom,
grown by cathodic RF sputtering on the substrates InP(100) and Ag, re
spectively, by using auger electron spectroscopy (AES) and electron en
ergy loss spectroscopy (EELS). The oxide ZnO/InP (100) is very stable
against the heating in UHV and does not seem to be subjected to a char
ge effect in AES. The auger spectrum O-KLL of SnO2 is compared with th
e ZnO one. The spectroscopy (ELS) displays that both oxides have simil
ar behaviours from the view-point of energy loss by plasmons. Copyrigh
t (C) 1996 Elsevier Science Ltd