An overall CVD process is very complex, with contributions from steps
which include gas-phase reactions, mass transport, surface-mediated ch
emistry, and nucleation. Traditional empirical optimization of growth
parameters is now being replaced by more rational approaches to unders
tanding the contributions of individual steps to the overall process.
Mechanisms of gas-phase pyrolysis of organometallic CVD precursors and
their influences on deposition are reviewed here. Examples given show
that spectroscopic techniques can provide valuable clues to factors w
hich affect layer quality.