GAS-PHASE PYROLYSIS MECHANISMS IN ORGANOMETALLIC CVD

Authors
Citation
Dk. Russell, GAS-PHASE PYROLYSIS MECHANISMS IN ORGANOMETALLIC CVD, CHEMICAL VAPOR DEPOSITION, 2(6), 1996, pp. 223
Citations number
101
Categorie Soggetti
Materials Science, Coatings & Films","Materials Sciences, Composites",Electrochemistry,"Physics, Condensed Matter
Journal title
ISSN journal
09481907
Volume
2
Issue
6
Year of publication
1996
Database
ISI
SICI code
0948-1907(1996)2:6<223:GPMIOC>2.0.ZU;2-V
Abstract
An overall CVD process is very complex, with contributions from steps which include gas-phase reactions, mass transport, surface-mediated ch emistry, and nucleation. Traditional empirical optimization of growth parameters is now being replaced by more rational approaches to unders tanding the contributions of individual steps to the overall process. Mechanisms of gas-phase pyrolysis of organometallic CVD precursors and their influences on deposition are reviewed here. Examples given show that spectroscopic techniques can provide valuable clues to factors w hich affect layer quality.