GAS-PHASE PYROLYSIS MECHANISMS IN ORGANOMETALLIC CVD

An overall CVD process is very complex, with contributions from steps which include gas-phase reactions, mass transport, surface-mediated ch emistry, and nucleation. Traditional empirical optimization of growth parameters is now being replaced by more rational approaches to unders tanding the contributions of individual steps to the overall process. Mechanisms of gas-phase pyrolysis of organometallic CVD precursors and their influences on deposition are reviewed here. Examples given show that spectroscopic techniques can provide valuable clues to factors w hich affect layer quality.