X-RAY-EMISSION CHARACTERIZATION OF CHROMI UM-OXIDE AND OXYNITRIDE FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING

The present work is devoted to the characterization by X-ray emission spectrometry of thin chromium oxide and oxynitride films deposited ont o low carbon steel substrates by reactive magnetron sputtering. Film t hicknesses were determined by XRFS through measurement of the intensit y of the Cr K-alpha radiations, the calibration being performed by gra vimetry. The composition variations of the films obtained in different experimental conditions were studied by low energy electron induced X -ray spectrometry (LEEIXS). The method, which is very efficient toward s the detection of light elements, oxygen and nitrogen in the present case, has pointed out significant stoichiometric variations on the one hand, and the presence of in-depth composition gradients on the other . This inhomogeneous composition was shown using the capability of LEE IXS to probe variable thicknesses merely by adjusting the excitation e nergy of the incident electrons. The results obtained were confirmed b y X-ray Photoelectron Spectrometry and Auger Electron spectrometry (pl ots of elementary in depth profiles in the last case).