NONTHERMAL EFFECT OF LASER-EMISSION OF NE AR AND MEDIUM IR RANGES ON SILICON OXIDATION

Authors
KHOVIV AM MITTOVA IY DUBOV SI
Citation
Am. Khoviv et al., NONTHERMAL EFFECT OF LASER-EMISSION OF NE AR AND MEDIUM IR RANGES ON SILICON OXIDATION, Zurnal tehniceskoj fiziki, 66(7), 1996, pp. 151-155
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
Zurnal tehniceskoj fiziki → ACNP
ISSN journal
00444642
Volume
66
Issue
7
Year of publication
1996
Pages
151 - 155
Database
ISI
SICI code
0044-4642(1996)66:7<151:NEOLON>2.0.ZU;2-2