HIGH ELECTRONIC EXCITATIONS AND ION-BEAM MIXING EFFECTS IN HIGH-ENERGY ION-IRRADIATED FE SI MULTILAYERS/

Citation
P. Bauer et al., HIGH ELECTRONIC EXCITATIONS AND ION-BEAM MIXING EFFECTS IN HIGH-ENERGY ION-IRRADIATED FE SI MULTILAYERS/, Journal of applied physics, 81(1), 1997, pp. 116-125
Citations number
33
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
81
Issue
1
Year of publication
1997
Pages
116 - 125
Database
ISI
SICI code
0021-8979(1997)81:1<116:HEEAIM>2.0.ZU;2-C
Abstract
Mossbauer spectroscopy (Fe-57) shows evidence for mixing effects induc ed by electronic energy deposition in nanoscale Fe/Si multilayers irra diated with swift heavy ions. A decrease in the mixing efficiency with electronic stopping power is reported; a threshold is found, under wh ich iron environment modifications no longer occur. The kinetics of Fe -Si phase formation after irradiation suggests the existence of three regimes: (i) for high excitation levels, a magnetic amorphous phase is formed directly in the wake of the incoming ion and an almost complet e mixing is reached at low fluence (10(13) U/cm(2)); (ii) for low exci tation levels, a paramagnetic Si-rich amorphous phase is favored at th e interface while crystalline iron subsists at high fluences; (iii) fo r intermediate excitation levels, saturation effects are observed and the formation rate of both magnetic and paramagnetic phases points to direct mixing in the ion wake but with a reduced track length in compa rison to U irradiation. The measured interfacial mixing cross section induced by electronic energy deposition suggests that a thermal diffus ion process is mainly involved in addition to damage creation. (C) Ame rican Institute of Physics.