S. Armyanov et al., AUGER-ELECTRON SPECTROSCOPY ELEMENT PROFILES AND INTERFACE WITH SUBSTRATES OF ELECTROLESS DEPOSITED TERNARY ALLOYS, Journal of the Electrochemical Society, 143(11), 1996, pp. 3692-3698
Electroless NiMeP alloys (Me = Cu, Sn, Sb) with high phosphorus conten
t (similar to 11 weight percent) and a low weight percent of the third
component (Me) have been plated in acidic baths onto aluminum, iron,
and nickel. Scanning Auger electron spectroscopy is applied to study t
he element profiles and interface with the substrates. Generally the t
hird component follows the profiles of Ni and P, which proves the allo
y formation. A surface enrichment in the third element (Me) is observe
d in all cases. It is very strong when tin is the third component and
very weak in the case of antimony, which is more or less uniformly dis
tributed through the thickness. Decrease of surface concentration of p
hosphorus is noticed when NiSbP is plated. In Cu profiles three differ
ent zones exist: a surface enrichment zone, a groove (a zone of reduce
d concentration), and a plateau (a zone of almost constant concentrati
on). There is no enrichment in the third element at the interface with
the substrate for all three alloys and three substrates. At the inter
face with aluminum prepared for electroless plating with double zincat
e pretreatment complete dissolution of the zincate layer has been esta
blished.