CHEMICAL-VAPOR-DEPOSITION OF SOME HETEROCYCLIC-COMPOUNDS OVER ACTIVE-CARBON FIBER TO CONTROL ITS POROSITY

Citation
Y. Kawabuchi et al., CHEMICAL-VAPOR-DEPOSITION OF SOME HETEROCYCLIC-COMPOUNDS OVER ACTIVE-CARBON FIBER TO CONTROL ITS POROSITY, Chemistry Letters, (11), 1996, pp. 941-942
Citations number
6
Categorie Soggetti
Chemistry
Journal title
ISSN journal
03667022
Issue
11
Year of publication
1996
Pages
941 - 942
Database
ISI
SICI code
0366-7022(1996):11<941:COSHOA>2.0.ZU;2-V
Abstract
Chemical vapor deposition (CVD) of heterocyclic compounds was examined over commercial pitch-based active carbon fiber (ACF). The ACF treate d with pyridine, pyrrole, and thiophene showed excellent performance i n the gas separation of CO2/CH4. Thermal stability of the aromatic com pounds around 700 degrees C appears an important factor to restrict it s decomposition on the pore wall where the compound is adsorbed and ca rbonized.