By changing the polarity of charged trap sites; we investigated the st
ability of densely contact-electrified charges on thin silicon oxide i
n air using a modified atomic force microscope. For usual silicon oxid
es with positively charged trap sites, a stable state is obtained only
for negative charge deposition, while for modified silicon oxides wit
h negatively charged trap sites, a stable state is obtained only for p
ositive charge deposition. As a result, we concluded that charged trap
sites make densely contact-electrified charges with the same polarity
unstable due to the strong Coulomb repulsive force.