THE FABRICATION OF SUBMICRON HEXAGONAL-ARRAYS USING MULTIPLE-EXPOSUREOPTICAL INTERFEROMETRY

Authors
KITSON SC BARNES WL SAMBLES JR
Citation
Sc. Kitson et al., THE FABRICATION OF SUBMICRON HEXAGONAL-ARRAYS USING MULTIPLE-EXPOSUREOPTICAL INTERFEROMETRY, IEEE photonics technology letters, 8(12), 1996, pp. 1662-1664
Citations number
9
Categorie Soggetti
Optics,"Physics, Applied
Journal title
IEEE photonics technology letters → ACNP
ISSN journal
10411135
Volume
8
Issue
12
Year of publication
1996
Pages
1662 - 1664
Database
ISI
SICI code
1041-1135(1996)8:12<1662:TFOSHU>2.0.ZU;2-J
Abstract
We report on the use of multiple-exposure optical interferometry combi ned with nonlinear development of photoresist to enable the fabricatio n of hexagonal arrays of dots. The capability of the technique is demo nstrated by the fabrication of a hexagonal array of 50-nm-radius dots having a 300-nm periodicity.