P. Martin et al., MICRORAMAN ANALYSIS OF TWIN LAMELLAE IN UNDOPED LEC INP, Journal of materials science. Materials in electronics, 5(6), 1994, pp. 315-320
A {221} twin lamella in undoped LEC InP was studied by means of a dilu
ted sirtl mixture applied with fight (DSL) photoetching and microRaman
spectroscopy. This study revealed that there was defect segregation a
t the twin boundary. This boundary-defect-depletion area would result
in an enhanced photocarrier lifetime and a stress relaxation that exte
nds a few micrometres away the boundary. From these results, it appear
s that the formation of this twin was strongly influenced by stoichiom
etry fluctuations during growth; these fluctuations were revealed by b
oth selective photoetching and by microRaman scanning spectroscopy.