SUBSTRATE HEATER FOR LARGE-AREA YBA2CU3OX FILMS GROWTH WITHOUT ELECTRICAL FEEDTHROUGHS

A new substrate heater based on an optical waveguide is demonstrated. The substrate heater is capable of heating a 2'' diameter substrate to 900 degrees C with a temperature uniformity better than +/- 2 degrees C. The substrate heater is ideal for use in reactive atmospheres beca use the heating source is placed outside the deposition chamber. The s ubstrate heater is used in a laser ablation deposition system. To over come the problem with the very narrow deposition profile typical for l aser ablation, the substrate heater may be scanned 2'' by 2''.