Mk. Hibbsbrenner et al., METALORGANIC VAPOR-PHASE EPITAXIAL-GROWTH OF RED AND INFRARED VERTICAL-CAVITY SURFACE-EMITTING LASER-DIODES, Microelectronics, 25(8), 1994, pp. 747-755
Metalorganic vapour phase epitaxy (MOVPE) is used For the growth of ve
rtical-cavity surface-emitting laser (VCSEL) diodes. MOVPE exhibits a
number of important advantages over the more commonly used molecular b
eam epitaxial (MBE) techniques, including ease of continuous compositi
onal and dopant grading for low-resistance p-type distributed Bragg re
flectors (DBRs), higher growth rates for rapid throughput and greater
versatility in choice of materials, especially with phosphorus, and do
pants. Top-emitting InGaAs/AlGaAs/AlAs 950 nm VCSELs exhibit the highe
st power conversion (wallplug) efficiencies (21%), lowest threshold vo
ltage (1.47 V), and highest single mode power (4.4 mW from an 8 mu m d
evice) yet reported. GaAs/AlGaAs/AlAs VCSELs lasing near 850 nm have d
emonstrated record low threshold voltage (1.7 V) at this wavelength, a
nd excellent uniformity in wavelength (+/- 1%) across a 3-inch wafer,
and in threshold voltage (+/- 1.5%), threshold current (+/- 10%) and o
utput power (+/- 20%) across a 34-element array. 650 nm VCSELs based o
n AlGaInP/AlGaAs heterostructures have been demonstrated by MOVPE only
, and lase continuous wave at room temperature, with voltage threshold
s between 2.5 and 3 V and maximum power outputs of over 0.3 mW. These
results establish MOVPE as a proven growth technique for this importan
t new family of photonic devices.