CHARACTERISTICS OF BORON REDISTRIBUTION I N NEAR-THE-SURFACE SILICON AREA DUE TO DIFFUSION FROM BOROSILICATE GLASS

Authors
ALEKSANDROV OV AFONIN NN ARSHINOV OM
Citation
Ov. Aleksandrov et al., CHARACTERISTICS OF BORON REDISTRIBUTION I N NEAR-THE-SURFACE SILICON AREA DUE TO DIFFUSION FROM BOROSILICATE GLASS, Zurnal tehniceskoj fiziki, 64(6), 1994, pp. 101-105
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
Zurnal tehniceskoj fiziki → ACNP
ISSN journal
00444642
Volume
64
Issue
6
Year of publication
1994
Pages
101 - 105
Database
ISI
SICI code
0044-4642(1994)64:6<101:COBRIN>2.0.ZU;2-8