DENSITY OF GAP STATES IN A-SIC-H FILMS BY MEANS OF PHOTOCONDUCTIVE AND PHOTOTHERMAL SPECTROSCOPIES

Citation
F. Demichelis et al., DENSITY OF GAP STATES IN A-SIC-H FILMS BY MEANS OF PHOTOCONDUCTIVE AND PHOTOTHERMAL SPECTROSCOPIES, Physica. B, Condensed matter, 205(2), 1995, pp. 169-174
Citations number
20
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
09214526
Volume
205
Issue
2
Year of publication
1995
Pages
169 - 174
Database
ISI
SICI code
0921-4526(1995)205:2<169:DOGSIA>2.0.ZU;2-V
Abstract
In the present work we report and discuss results on the gap density o f states for a-SiC:H films, deposited by PECVD with different CHL flow rates, through the deconvolution of CPM and PDS spectra. The occupied density of states in the gap is in first approximation the derivative of the CPM spectrum with respect to the photon energy. Below the Urba ch edge the PDS and CPM techniques are sensitive to different electron ic transitions. From the difference between PDS and CPM spectra the de ep unoccupied density of defects above the Fermi level can be deduced. This procedure has been applied for the first time to the a-SiC:H bin ary alloy. We have obtained that the defect distribution ascribed to s ilicon dangling bonds can be fitted by gaussian curves with increasing correlation energy and halfwidths as the carbon content increases.