IMPLANTED-FLUORINE DEPTH PROFILES IN MOLYBDENUM

Citation
C. Tan et al., IMPLANTED-FLUORINE DEPTH PROFILES IN MOLYBDENUM, Applied physics A: Materials science & processing, 60(3), 1995, pp. 313-316
Citations number
20
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
60
Issue
3
Year of publication
1995
Pages
313 - 316
Database
ISI
SICI code
0947-8396(1995)60:3<313:IDPIM>2.0.ZU;2-I
Abstract
Implanted-fluorine profiles in molybdenum have been accurately measure d using F-19(p, alpha gamma)O-16 resonant nuclear reaction at E(R) = 8 72.1 keV. A proper convolution-calculation method was used to extract the true distribution of fluorine from the experimental excitation-yie ld curves. The range-distribution parameters, R(p) and Delta R(p), wer e thereby obtained and were compared with those obtained by Monte-Carl o simulation with a computer code developed recently in this gorup, an d the TRIM'90 code. They show that the experimental R(p) values agree very well with the Monte-Carlo simulation values, while the experiment al Delta R(p) values are larger than those obtained from the simulatio ns.