Tj. Boyle et Rw. Schwartz, AN INVESTIGATION OF GROUP-(IV) ALKOXIDES AS PROPERTY CONTROLLING REAGENTS IN THE SYNTHESIS OF CERAMIC MATERIALS, Comments on modern chemistry. Part A, Comments on inorganic chemistry, 16(5), 1994, pp. 243-278
Chemical synthetic methodologies are frequently employed to fabricate
ceramic materials. To assist in determining methods for control over t
he final properties of ceramic materials, we have begun an investigati
on of the basic chemistry of sol-gel precursor solutions for lead zirc
onate titanate (PZT) thin films. The reactions between ''M(OCHMe(2))(4
)'' (M = Ti, Zr) and acetic acid were monitored by H-1, C-13, O-17 NMR
, and X-ray crystallography. The results of this investigation, the co
mplexes generated, (Ti-6(OCHMe(2))(12)(OAc)(4)O-4, 1, Ti-6(OCHMe(2))(8
),(OAc)(8)O-4, 2), and the types of films produced are reported. The s
ynthesis of novel Group (IV) metal alkoxide complexes has been underta
ken to generate precursors for ceramic materials with the desired char
acteristics internalized. In an attempt to reduce hydrolysis, the form
ation of a variety of metallo-organic compounds containing the sterica
lly bulky adamantan-1-ol ligand (AdamO-H) was studied. It was demonstr
ated that the OCHMe(2) ligands of ''M(OCHMe(2))(4)'' (M = Ti, Zr) were
easily replaced with AdamO, forming compounds with the empirical form
ula ''(AdamO)(n)M(OCHMe(2))(4-n),'' (n = 1,2, 3, or 4). Spin-cast depo
sited films of these compounds were not affected by ambient humidity a
nd crystallize upon evaporation of the solvent. Another set of alkoxid
e ligands which has been investigated is a series of tridentate alkyl
alkoxides: 1,1,1-tris(hydroxymethyl)ethane (THME-H-3), 1,1,1-tris(hydr
oxymethyl)propane (THMP-H-3), 1,3,5-cyclohexanetriol (CYHT-H-3,), and
2,2-bis(hydroxymethyl) proprionic acid (BHMP-H-3). These ligands have
been reacted with Group 4 metal alkoxides to form a variety of precurs
ors that have been identified by spectroscopic and analytical methods.
The THME and THMP ligated complexes are of the general formula (THMR)
(2)M(4)(OCHMe(2))(10) [R = E, M = Ti, 3, and Zr, 4; R = P, M = Ti, 5 a
nd Zr]. Films of these compounds demonstrate reduced susceptibility to
hydrolysis when compared to the standard starting materials Ti(OCHMe(
2))(4), 6, and [Zr(OCHMe(2))(4) . HOCHMe(2)](2), 7.