Z. Bor et al., FEMTOSECOND TRANSIENT REFLECTION FROM POLYMER SURFACES DURING FEMTOSECOND UV PHOTOABLATION, Applied physics A: Materials science & processing, 60(4), 1995, pp. 365-368
A subpicosecond KrF laser system (248 nm, 0.5 ps) was used as a light
source for ablation of PMMA Mylar and Kapton. The time-dependent refle
ctivity of the light-induced plasma mirror as measured by 496 nm, 0.5
ps long probe pulses showed an increase of up to 94% with 0.4-1 ps ris
e time and 10-15 ps fall time. The high-density plasma mirror shows pe
rfect optical quality, and seems to be a promising light-controlled ul
trafast switch for UV and visible light. The spectrum of the UV light
reflected from the ablated spot is blue shifted by 0.5 nm and shows 1
nm broadening.