THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY

Authors
PUYENBROEK R BOSSCHER G VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation
R. Puyenbroek et al., THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY, Phosphorus, sulfur and silicon and the related elements, 93(1-4), 1994, pp. 277-280
Citations number
6
Categorie Soggetti
Chemistry Inorganic & Nuclear
Journal title
Phosphorus, sulfur and silicon and the related elements → ACNP
ISSN journal
10426507
Volume
93
Issue
1-4
Year of publication
1994
Pages
277 - 280
Database
ISI
SICI code
1042-6507(1994)93:1-4<277:TAOPCP>2.0.ZU;2-E
Abstract
New terpolymers containing phosphazene, epoxy and silicon moieties hav e been synthesized which were used as negative resists in microlithogr aphy. In addition to synthesis and characterization, lithographic prop erties are discussed.