THERMAL-DIFFUSIVITY MEASUREMENT OF THERMALLY CONDUCTING FILMS ON INSULATING SUBSTRATES

Authors
DEJESUS MEP IMHOF RE
Citation
Mep. Dejesus et Re. Imhof, THERMAL-DIFFUSIVITY MEASUREMENT OF THERMALLY CONDUCTING FILMS ON INSULATING SUBSTRATES, Applied physics A: Materials science & processing, 60(6), 1995, pp. 613-617
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
Applied physics A: Materials science & processing → ACNP
ISSN journal
09478396
Volume
60
Issue
6
Year of publication
1995
Pages
613 - 617
Database
ISI
SICI code
0947-8396(1995)60:6<613:TMOTCF>2.0.ZU;2-9
Abstract
We report thermal diffusivity measurements of thin Niobium films on gl ass substrates, using OptoThermal Transient Emission Radiometry (OTTER ). The result is a thermal diffusivity value of D = (2.79 +/- 0.36) x 10(-5) m(2)/s, which is within 17% of the accepted value for multicrys taline bulk niobium. The technique is remote sensing, non-destructive, and the measurements depend only on the thickness of the film and the thermal properties of the substrate.