K. Fujita et al., X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES ON PYROLYSIS OF PLASMA-POLYMERIZED FLUOROCARBON FILMS ON SI, JPN J A P 1, 34(1), 1995, pp. 304-306
Temperature-programmed X-ray photoelectron spectroscopy was used to st
udy pyrolysis of fluorocarbon thin films polymerized on Si substrates
in magnetomicrowave plasma with C4F8 gas. Variations of fluorocarbon m
oieties were obtained at the temperature range between 20 and 700 degr
ees C. The films, consisting of CF3, CF2, CF and C-CFx bonds, were fou
nd to be stable up to approximately 200 degrees C and to be pyrolyzed
via the dissociation of the terminal bonds above this temperature.