X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES ON PYROLYSIS OF PLASMA-POLYMERIZED FLUOROCARBON FILMS ON SI

Authors
FUJITA K MIYAKAWA Y HIRASHITA N
Citation
K. Fujita et al., X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES ON PYROLYSIS OF PLASMA-POLYMERIZED FLUOROCARBON FILMS ON SI, JPN J A P 1, 34(1), 1995, pp. 304-306
Citations number
5
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
34
Issue
1
Year of publication
1995
Pages
304 - 306
Database
ISI
SICI code
Abstract
Temperature-programmed X-ray photoelectron spectroscopy was used to st udy pyrolysis of fluorocarbon thin films polymerized on Si substrates in magnetomicrowave plasma with C4F8 gas. Variations of fluorocarbon m oieties were obtained at the temperature range between 20 and 700 degr ees C. The films, consisting of CF3, CF2, CF and C-CFx bonds, were fou nd to be stable up to approximately 200 degrees C and to be pyrolyzed via the dissociation of the terminal bonds above this temperature.