ULTRA-THIN FILM GROWTH OF PD BY RADICAL ENHANCED VAPOR-DEPOSITION

Authors
FUJIMOTO T KOJIMA I
Citation
T. Fujimoto et I. Kojima, ULTRA-THIN FILM GROWTH OF PD BY RADICAL ENHANCED VAPOR-DEPOSITION, JPN J A P 1, 34(5A), 1995, pp. 2461-2462
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
34
Issue
5A
Year of publication
1995
Pages
2461 - 2462
Database
ISI
Abstract
The vapor deposition of Pd on graphite was carried out in an oxygen ra dical atmosphere, and resulting surfaces were analyzed by an Auger ele ctron microprobe and a scanning tunneling microscope. In contrast with deposition under oxygen atmosphere or under vacuum, coexistence of th e oxygen radical during deposition enabled the Pd to form an ultra thi n film whose thickness was 0.6 nm.