EFFECTS OF DEPOSITION PARAMETERS ON THE TEXTURE OF CHROMIUM FILMS DEPOSITED BY VACUUM ARE EVAPORATION

The aim of this paper is to elucidate the influence of the deposition parameters on the structure and the texture of thin chromium films obt ained by vacuum are evaporation. Both parameters related directly to t he deposition process such as the argon pressure, are current and bias voltage, and those concerning the substrate such as its temperature a nd its nature, are taken into consideration. The structure and the tex ture were analysed by X-ray diffraction (XRD). It was found that only two parameters have a strong influence on these characteristics: the s ubstrate temperature and the bias voltage. The increase in substrate t emperature causes the (110) texture to change to a (200) texture, wher eas the increase in bias voltage (in absolute value) tends to enhance the (110) texture. It was also found that the texture of the chromium films seems to be very sensitive to the presence of impurities.