CH3 RADICAL DENSITY IN ELECTRON-CYCLOTRON-RESONANCE CH3OH AND CH3OH H-2 PLASMAS/

Citation
M. Ikeda et al., CH3 RADICAL DENSITY IN ELECTRON-CYCLOTRON-RESONANCE CH3OH AND CH3OH H-2 PLASMAS/, JPN J A P 1, 34(6A), 1995, pp. 3273-3277
Citations number
18
Categorie Soggetti
Physics, Applied
Volume
34
Issue
6A
Year of publication
1995
Pages
3273 - 3277
Database
ISI
SICI code
Abstract
CH3 radical densities in electron cyclotron resonance (ECR) discharge methanol (CH3OH), methanol diluted with hydrogen gas (CH3OH/H-2) and m ethane (CH4) plasmas were measured for the first time using infrared d iode laser absorption spectroscopy (IRLAS). CH3 radical densities in t he CH3OH and CH3OH/H-2 plasmas were estimated to be of the order of 10 (11) cm(-3) under the conditions of total pressure of 1.3 Pa and micro wave power of 50-800 W. On the other hand, CH3 radical density in the CH4 plasma was estimated to be less than 10(10) cm(-3). Moreover, the production and loss processes of CH3 radical in the CH3OH plasma were discussed on the basis of the results of emission intensity of Ar, th e absorption ratio of CH3OH molecule and the decay curve analysis of C H3 radical after termination of the discharge.