Jh. Jean et Th. Kuan, COMPOSITIONAL DESIGN AND PROPERTIES OF A LOW-KAPPA SILICA DIELECTRIC FOR MULTILAYER CERAMIC SUBSTRATE, JPN J A P 1, 34(4A), 1995, pp. 1901-1905
Compositional design and properties of a lo N-dielectric-constant sili
ca composite containing borosilicate glass, high-silica glass and gall
ium oxide are described. A cristobalite-free silica dielectric with a
high sintered density, >95%, is obtained at temperatures less than 100
0 degrees C. An analytical approach assuming the mixing rule is used t
o design compositions with desirable properties, and validated by expe
rimental results. Compositions with a thermal expansion coefficient co
mpatible with Si and GaAs, and dielectric constants in the ranges of 4
-5 and 5-6, respectively, at 1 MHz, are developed.