(100)PREFERRED ORIENTATION OF SPINEL-TYPE IRON-OXIDE FILMS PREPARED BY PLASMA-ENHANCED METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Spinel-type iron oxide films were prepared on glass substrates at 400 OC by plasma-enhanced metalorganic chemical vapor deposition using iro n (III) acetylacetonate and oxygen as source gas and oxidizing gas, re spectively. The effects of angle (theta) of the source and oxygen gas nozzle to the substrate surface, applied negative de bias voltage and addition of reducing gas, H-2, on the orientation of the films have be en investigated. Highly crystalline and (100)-oriented spinel-type iro n oxide films were obtained under conventional conditions only when th eta was lower than 20 degrees. However, even for theta higher than 20 degrees, highly crystalline and (100)-oriented films could be obtained by applying negative de bias voltage or adding H-2 during the deposit ion. Magnetic properties and microstructures of the films were also ex amined.