SELF-DEVELOPMENT MECHANISM OF NITROCELLULOSE RESIST - ELECTRON-BEAM IRRADIATION

The decomposition mechanism of a nitrocellulose film induced by irradi ation of an electron beam and He+ ion beam was investigated by monitor ing the changes of the infrared spectra. With irradiation of the elect ron beam, it was found that the electronic stopping power caused the d ecomposition of the nitrocellulose resist by breaking the R-O-NO2 bond . In addition, it was found that oxidation due to oxygen supplied from NO2 enhanced the decomposition, and finally, a residue was formed. Th is is almost the same result as obtained by heat treatment. In the cas e of He+ ion irradiation, the electronic stopping power caused the sam e decomposition process as did irradiation of the electron beam. Howev er, the residue formed was sputtered off due to the nuclear stopping p ower.