The first nucleated phase in compositionally modulated Nb/Si multilaye
rs was identified using transmission electron microscopy (TEM) and X-r
ay diffraction (XRD). A cubic Nb3Si phase was found to be formed when
the Nb/Si multilayers were deposited at 200 degrees C and 300 degrees
C. The formation of the crystalline silicide at such low temperatures
is explained on the basis of theories of the effective heat of formati
on and classical nucleation.