A MONTE-CARLO STUDY OF PROXIMITY EFFECTS IN ELECTRON-BEAM PATTERNING OF HIGH-T-C SUPERCONDUCTING THIN-FILMS

In the present work the proximity effects during the electron-beam lit hography of YBa2Cu3O7 high temperature superconducting thin films depo sited on two typical substrates (SrTiO3 and MgO) were studied at vario us beam voltages (25, 50, and 75 kV) by means of the Monte Carlo simul ation. The radial distributions of the absorbed electron energy densit y obtained for all possible sets of initial conditions were approximat ed by an analytical function (namely a combination of a double Gaussia n and an exponential function) and the parameters of this function wer e calculated. The distributions obtained in the present work as well a s the calculated parameters of the so-called ''proximity function'' ca n be used in a proper proximity effect correction algorithm as well as in a profile development model.