MAGNETIC HYSTERESIS IN STRESSED 15-NM-THICK NI FILMS

The magnetic hysteresis loops of mechanically stressed 15-nm-thick Ni film, measured by the magneto-optical technique, were analyzed using t he Stoner-Wohlfarth model. The influence of external stress on the sha pe of the hysteresis loop is accurately described by stress-induced un iaxial anisotropy. The energy of the domain structure during magnetiza tion reversal is equivalent to an additional uniaxial anisotropy. The processes of domain appearance and disappearance correspond to two dif ferent magnitudes pf this anisotropy, while the moment of the change o f anisotropy magnitude corresponds to the transformation of the Neel w alls. (C) 1996 American Institute of Physics.