By an extensive micro-Raman study, oval-defect-related morphological,
compositional and carrier concentration inhomogeneities were studied i
n MBE-grown GaAs and AlxGa1-xAs epitaxial layers. It was found that th
e crystalline morphology changes from point to point in the same defec
t. Though the films remain in a rather good crystalline state, the def
ects are shown to induce stress/strain in these films. The carrier con
centration at the oval defects was also found to be less than at the e
pitaxial layers.