INHOMOGENEITIES IN MBE-GROWN GAAS ALXGA1-XAS - A MICRO-RAMAN STUDY/

Citation
Ps. Dobal et al., INHOMOGENEITIES IN MBE-GROWN GAAS ALXGA1-XAS - A MICRO-RAMAN STUDY/, Semiconductor science and technology, 11(3), 1996, pp. 315-322
Citations number
40
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
11
Issue
3
Year of publication
1996
Pages
315 - 322
Database
ISI
SICI code
0268-1242(1996)11:3<315:IIMGA->2.0.ZU;2-A
Abstract
By an extensive micro-Raman study, oval-defect-related morphological, compositional and carrier concentration inhomogeneities were studied i n MBE-grown GaAs and AlxGa1-xAs epitaxial layers. It was found that th e crystalline morphology changes from point to point in the same defec t. Though the films remain in a rather good crystalline state, the def ects are shown to induce stress/strain in these films. The carrier con centration at the oval defects was also found to be less than at the e pitaxial layers.