GaAs samples grown by chemical beam epitaxy and doped using (CBr4)-C-1
2 or (CBr4)-C-13 to give carbon concentrations of similar to 1 x 10(19
) cm(-3) have been analysed by local vibrational mode infrared spectro
scopy, secondary-ion mass spectrometry, Hall measurements and electroc
hemical capacitance-voltage profiling. By exposure to a hydrogen plasm
a similar to 80% passivation of the carbon was achieved. A calibration
for the stretch mode of H-C-As pairs in GaAs has been established ind
icating that an integrated absorption of 1 cm(-2) in the LVM line at 2
635.2 cm(-1) (H-C-12(As)) corresponds to a concentration of 9+/-2 x 10
(15) pairs/cm(3). This calibration is approximately half that of the m
ost recently published value. Reasons for the difference are discussed
.