Unalloyed Ti is sputter deposited in the formation of two trilayer fil
ms. Each layer within the combinations of Ni-Ti-Ni and Ti-Ni-Ti is les
s than 0.1 mu m thick. High resolution imaging and electron diffractio
n results are presented for the microstructural characterization of bo
th trilayer films. Nanophase fcc Ti is initially found in crystalline
layers grown on Ni whereas hcp Ti is found in layers grown without a N
i epilayer. Conditions are further examined under which the fcc to hcp
transition occurs for Ti deposited on Ni.