SI C PHASES FROM THE IR LASER-INDUCED DECOMPOSITION OF SILACYCLOBUTANE AND 1,3-DISILACYCLOBUTANE/

Citation
Z. Bastl et al., SI C PHASES FROM THE IR LASER-INDUCED DECOMPOSITION OF SILACYCLOBUTANE AND 1,3-DISILACYCLOBUTANE/, Applied organometallic chemistry, 10(2), 1996, pp. 83-99
Citations number
64
Categorie Soggetti
Chemistry Applied","Chemistry Inorganic & Nuclear
ISSN journal
02682605
Volume
10
Issue
2
Year of publication
1996
Pages
83 - 99
Database
ISI
SICI code
0268-2605(1996)10:2<83:SCPFTI>2.0.ZU;2-0
Abstract
CO2 laser-induced infrared multiphoton decomposition (IRMPD) and SF6 p hotosensitized decomposition (LPD) of silacyclobutane (SCB) and 1,3-di silacyclobutane (DSCB) in the gas phase results in the very efficient deposition of Si/C/H and SiC materials, and it is inferred that the pr ocess is dominated by formation of transient silene; silene rearrangem ent to methylsilylene; silene and methylsilylene dehydrogenation; and polymerization of SICHn (n < 4) species. The deposits are sensitive to oxygen. Decomposition and SIC formation are favoured with IRMPD exper iments conducted with high-energy fluxes. The laser technique is promi sing for low-temperature chemical vapour deposition of amorphous SiC.