Nk. Velleitner et al., KINETICS AND MECHANISMS OF THE PHOTOLYTIC AND OH-DEGREES RADICAL-INDUCED OXIDATION OF FLUORINATED AROMATIC-COMPOUNDS IN AQUEOUS-SOLUTIONS, Chemosphere, 32(5), 1996, pp. 893-906
Laboratory experiments with H2O2/UV oxidation processes and photolysis
at 253.7 nm wavelength have been carried out on dilute aqueous soluti
ons (C-0 = 0.1 to 3.0 mM) of trifluorobenzene derivatives (1,3,5-trifl
uorobenzene, 1,2,3 and 1,2,4-trifluorobenzene) and of alpha,alpha,alph
a-trifluorotoluene in the presence and in the absence of dissolved oxy
gen. The analyses of fluoride ions content during the oxidation experi
ments showed that the first steps lead to the production of about 2 mo
l of F-/mol of trifluorobenzene decomposed and of 1 mol of F-/mol of t
rifluorotoluene decomposed. Kinetic studies lead to the determination
of the quantum yield for-the photolysis of 1,3,5-trifluorobenzene, 1,2
,3 and 1,2,4-trifluorobenzene (phi = 0.011, 0.010 and 0.015 respective
ly), and of trifluorotoluene (phi = 0.015). The rate constants for the
reaction of hydroxyl radicals with these molecules, determined under
specific experimental conditions, were found to range from 3.7 10(9) t
o 4.9 10(9) M(-1).s(-1)). GC/MS analyses carried out on extracts at di
fferent irradiation time (UV, H2O2/UV) lead to the identification of n
umerous by-products from trifluorobenzene and trifluorotoluene. They c
onsist mostly in hydroxylated and dehalogenated compounds. Dimers have
also been observed during photolysis. Moreover, experiments carried o
ut under oxygen limiting conditions revealed the formation of other co
mpounds. For each case studied, a detailed mechanism involving radical
intermediates and the different reaction sequences is proposed.