EFFICIENT NEGATIVE-ION SOURCES FOR TANDEM INJECTION

Citation
Wt. Diamond et al., EFFICIENT NEGATIVE-ION SOURCES FOR TANDEM INJECTION, Review of scientific instruments, 67(3), 1996, pp. 1404-1409
Citations number
21
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
ISSN journal
00346748
Volume
67
Issue
3
Year of publication
1996
Part
2
Pages
1404 - 1409
Database
ISI
SICI code
0034-6748(1996)67:3<1404:ENSFTI>2.0.ZU;2-Y
Abstract
Tandem-accelerator operation requires a source of negative ions. The e arliest negative-ion sources were based on charge exchange of positive ions from a rf or duoplasmatron source. The development of the sputte r-ion source in the 1970's produced a revolutionary change in the numb er of negative-ion beams for Tandem operation. This article will revie w operational characteristics of sputter-ion sources coupled to large Tandem accelerators. These characteristics and matching of the ion sou rce to the accelerator are determining factors for the production of u seful beam intensities for physics experiments. A new approach using a 2.45 GHz microwave ion source to produce a high-quality, positive-ion beam coupled to a charge-exchange canal is being developed at Chalk R iver Laboratories, and some results of this development program will b e presented. Plans for future development include the investigation of direct extraction of negative ions from a microwave-driven plasma. (C ) 1996 American Institute of Physics.